The Zelenograd Nanotechnology Center (ZNTC) has completed the third research and development stage of its first lithography tool for 200mm wafers using 130nm process technology, according to Russian news site CNews. The prototype is currently being tested internally and is years away from being used in a real fab for mass chip production.
Blogger Dmitrii Kuznetsov has described the device as the first Russian 130nm-capable lithography tool made up of components produced in Russia. Tom's Hardware reports that this may not be the case. Documents seen by CNews indicate that Belarus-based Planar was responsible for developing the system, manufacturing mechanical assemblies and components, and commissioning the prototype, while lasers for the unit were developed by Lassard. ZNTC leads the project.
Alexander Mikhailov, an analyst with Strategy Partners, told CNews that the prototype is an important milestone for Russia's microelectronics industry. "It demonstrates that Russia has its own engineering expertise required to develop such equipment and paves the way for developing a range of systems targeting smaller process nodes (90nm and 65nm)," he said.
The 130nm node dates to the early 2000s, leaving the Russian effort roughly a generation or more behind commercial leaders. Earlier reports referenced a "30-year-old outdated lithography tool" in connection with the project.