Chinese startup unveils prototype EUV light source in push to replace ASML tools
A Chinese startup founded by Tsinghua University alumni has demonstrated a prototype extreme ultraviolet (EUV) light source for chipmaking, the latest step in China's drive to build the advanced lithography equipment it cannot buy from Dutch supplier ASML. Langdao Silex exhibited the device at the 26th China International Industry Fair in Shanghai, claiming over 15 watts of output power with 90 percent domestic components.
